NECK CREAM | Mature Skin Only | Anti-Aging, Lifting & Firming | 50ml
The HSR Lifting Neck and Décolleté Cream sets new standards in the field of cosmetic lifting at BABOR: The innovative complex of active ingredients visibly reduces all types of wrinkles by targeting the roots of wrinkle formation and reduces age spots and hyperpigmentation. The remarkably smooth texture is perfectly absorbed and generates intense moisture and a luxurious skincare sensation.
Luxurious specialty skincare for the neck and décolleté that reduces the look of all types of wrinkles, slows down the formation of new wrinkles, and reduces the look of hyperpigmentation. In addition to the innovative active ingredient concept, the unique texture makes HSR Anti-Wrinkle Neck & Décolleté Cream a true skincare icon. The application becomes a daily deluxe experience.
BENEFIT
A personal lifting experience for your neck and décolleté that visibly evens, smooths and firms.
Apply HSR Anti-Wrinkle Neck & Décolleté Cream to the neck and décolleté after cleansing in the morning and/or evening and massage gently into the skin.
AQUA, GLYCERIN, SESAMUM INDICUM SEED OIL, GLYCERYL STEARATE CITRATE, COCO-CAPRYLATE, BETAINE, PRUNUS ARMENIACA KERNEL OIL, CETEARYL ALCOHOL, DICAPRYLYL CARBONATE, DICAPRYLYL ETHER, HELIANTHUS ANNUUS SEED OIL, TOCOPHERYL ACETATE, HYDROGENATED VEGETABLE GLYCERIDES, PANTHENOL, PHENOXYETHANOL, STEVIOSIDE, GLYCERYL GLUCOSIDE, SCLEROTIUM GUM, PARFUM, GELLAN GUM, CARNOSINE, PANICUM MILIACEUM SEED EXTRACT, GLYCINE SOJA PROTEIN, CITRIC ACID, ETHYLHEXYLGLYCERIN, TOCOPHEROL, XANTHAN GUM, LUPINUS ALBUS SEED EXTRACT, MICA, PISUM SATIVUM EXTRACT, LECITHIN, CAPRYLYL GLYCOL, HYDROLYZED PINUS SIBIRICA SEEDCAKE EXTRACT, SODIUM CITRATE, SODIUM COCOYL GLUTAMATE, POTASSIUM SORBATE, TANNIC ACID, SODIUM BENZOATE, ACANTHOPANAX SENTICOSUS ROOT EXTRACT, PENTYLENE GLYCOL, PHENETHYL ALCOHOL, PANTOLACTONE, SACCHARIDE ISOMERATE, SILICA, SODIUM HYDROXIDE
The ingredients are listed in descending order calculated by volume in accordance with the mandatory labeling requirements.